Ultra Defect free Germanium Photodiode in SOI substrates
This technology introduces an innovative method for producing ultra-thin, defect-free germanium photodiodes on silicon-on-insulator (SOI) substrates, overcoming longstanding challenges related to lattice mismatch defects.
Background:
Conventional attempts to integrate germanium photodiodes on SOI substrates have faced significant challenges due...
Published: 9/9/2026
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Inventor(s): Gerald Leake, Joshua Herman, Christopher Baiocco
Keywords(s): compound semiconductor, defect-tolerant semiconductor, design, detection, electronics, photonics, semiconductor processing, substrate technology, Technologies
Category(s): Campus > AIM Photonics, Technology Classifications > Optics and Photonics
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