Sub-5 nm Pitch Lamellar Microdomains by Chemical Transformations
A method of fabricating microphase separated block copolymer thin films with ordered, sub-5 down to sub-3 nm full pitch lamellar microdomains.
Background:
Current photolithographic processes are generally unable to achieve size scale features in the single nanometer range, which is highly desirable for microelectronic and storage devices. While...
Published: 2/2/2024
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Inventor(s): Javid Rzayev, Thomas Russell, Duk Man Yu, Jose Kenneth Mapas
Keywords(s): Technologies
Category(s): Technology Classifications > Materials and Chemicals, Campus > University at Buffalo
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