Alkynyl Ligands for Metal-Containing EUV Resists
This technology is a method for producing metal-containing resists for EUV lithography that provide cleaner toes and higher contrast.
Background:
A photoresist is a type of photosensitive material that undergoes chemical change when exposed to light. They are widely used in the manufacture of microcircuits. One type of photoresist reacts to extreme...
Published: 3/24/2026
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Inventor(s): Robert Brainard, Munsaf Ali
Keywords(s): EUV, EUV photoresists, lithography, photoresists, Technologies
Category(s): Technology Classifications > Optics and Photonics, Campus > University at Albany
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