Aluminum Nitride, Alumina (Sapphire) and thick Silicon Nitride Integration into SUNYRFs quantum Platform
This technology integrates aluminum nitride, alumina (sapphire), and thick silicon nitride into a quantum photonics platform, enabling advanced device performance across visible to infrared wavelengths.
Background:
Quantum photonics requires innovative materials and device architectures to improve functionality, especially for non-linear photonics...
Published: 9/29/2026
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Inventor(s): Gerald Leake, Lewis Carpenter, Tuan Vo, Matthew Smalley, David Harame, Dan Coleman
Keywords(s): photonics, Technologies
Category(s): Campus > AIM Photonics, Technology Classifications > Optics and Photonics
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Tuning Characteristics of Films formed by Atomic Layer Deposition Through Underlayer Modification
Tuning Characteristics of Films formed by Atomic Layer Deposition Through Underlayer Modification
Background:
The field of thin film deposition, particularly using atomic layer deposition (ALD), is critical for the fabrication of advanced electronic and quantum devices. Tantalum nitride (TaN) thin films are widely used as diffusion barriers, etch-stop...
Published: 3/25/2026
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Inventor(s): Hunter Frost, Christopher Borst, Ekta Bhatia, Tuan Vo, Soumen Kar, Satyavolu Papa Rao
Keywords(s): CMOS interconnects, Quantum computing, single flux quantum logic, Technologies
Category(s): Campus > NY CREATES, Technology Classifications > Quantum Computing, Campus > University at Albany
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