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Positive-Tone Metal-Containing EUV Resists

 A novel platform of positive-tone metal-containing resists for use in EUV lithography. Background: Positive-tone resists are required for the most demanding features in the fabrication of integrated circuits such as etching a “contact hole.” One challenge in the design of metal containing resists is the scarcity of resists that exhibit...
Published: 8/5/2025   |   Inventor(s): Robert Brainard, Jordan Greenough
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute

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